CHIMICA FISICA APPLICATA

The course is aimed to provide advanced knowledge on methodologies for the preparation and characterization of micro- and nano- structured surfaces and materials.

I - Phase transport and separation processes in materials.
Mass transport and diffusion laws; solution of the diffusion equation for some simple systems. Phase separation processes. Spinodal decomposition, nucleation and growth.

II - Methods for obtaining micro- and nano- structured systems.

Patterning methods. Top-down and bottom-up approaches. Lithographic methods: optical lithography, e-beam and ion-beam lithography. Soft lithography. Non-lithographic patterning methods.

III - Techniques for spatially resolved chemical characterization of thin films and surfaces.

Ion beam-based method. General concepts. RBS, MEIS, LEIS. Secondary ion Mass spectrometry and related techniques. Methods based on interaction with plasmas. General concepts. GD-MS and GD-OES. Electron spectroscopy. Near field blends. Atom probe tomography.

Students are encouraged to perform autonomous bibliographic search. Guidelines and indications on texts, different for each of the topics coveredin the course, will be provided by the teacher. Furthermore, the electronic copy of the lecture slides and, on some topics, additional material in electronic format, will be made available.