CHEMICAL-PHYSICAL METHODOLOGIES FOR NANOTECHNOLOGIES

The course is meant to provide advanced knowledge about methodologies for the preparation and the characterisation of micro- and nano-structured surfaces and materials.

In particular, with regards to: 
- knowledge and understanding, the objective is to learn the principles and foundations that underlie the preparation methodologies and characterization techniques of surfaces and micro- and nano-structured materials;
- the ability to apply knowledge and understanding, the objective is to apply what has been learned in class in the design of experiments aimed at the preparation and characterization of micro- and nano-structured systems;
- autonomy of judgement, the objective is to correctly interpret experimental scientific data;
- the ability to communicate, the objective is to communicate the concepts learned in class, and more generally scientific topics, with language properties, rigor and accuracy;
- the ability to continue the study independently, the objective is to enable students to apply the knowledge learned during the lectures to all those situations that require the set up of experiments, from the preparation of samples to their characterization, in critical and correct manner.

The couse consists of classes and class exercises.

Basic knowledge of mathematics, physics and physical-chemistry (at least one course for each topic).

Attendance is normally compulsory. Partial or total justified exemptions from attendance, in addition to those provided for by the art. 27 of the "Regolamento Didattico di Ateneo", can be recognised by the "Consiglio di Corso di Studi" upon presentation of motivated request considered acceptable the "Consiglio".

I - An outline of transport processes.
Mass transport and diffusion laws. 

II - Methods for obtaining  micro- and nano- structured systems.

Patterning methods. Top-down and bottom-up approaches. Lithographic methods: optical lithography, e-beam and ion-beam lithography. Soft lithography. Non-lithographic patterning methods.

III - Techniques for spatially resolved chemical characterization of thin films and surfaces.

Ion beam-based method. RBS, MEIS, LEIS. Secondary ion Mass spectrometry and related techniques. Methods based on interaction with plasmas. General concepts. GD-MS and GD-OES. Electron spectroscopy. Outline of atomic force microscopy.

IV - Advanced data treatment methods.

Students are encouraged to perform autonomous bibliographic research. Guidelines and indications on texts, different for each of the topics covered in the course, will be provided by the professor. Furthermore, the electronic copy of the lecture slides and, on some topics, additional material in electronic format, will be made available.

Oral exam. The student will have to discuss a scientific article of choice (it can be agreed in advance with the professor) on a topic relevant to the course. The exam will continue with questions concerning topics presented during the course.

- Basic principles of "Static SIMS"

- Examples of plasmas' applications

- Factors affecting the resolution in a lithographic process